Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering

Abstract:

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This work compares the piezoresistive properties of SiC thin films produced by two techniques enhanced by plasma, PECVD (plasma enhanced chemical vapor deposition) and RF magnetron sputtering. In order to study these properties, strain gauges based on SiC films produced were fabricated using photolithography techniques in conjunction with lift-off processes. The beam-bending method was used to characterize the SiC strain gauges fabricated.

Info:

Periodical:

Materials Science Forum (Volumes 679-680)

Edited by:

Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson

Pages:

217-220

DOI:

10.4028/www.scientific.net/MSF.679-680.217

Citation:

M. A. Fraga "Comparison between the Piezoresistive Properties of a-SiC Films Obtained by PECVD and Magnetron Sputtering", Materials Science Forum, Vols. 679-680, pp. 217-220, 2011

Online since:

March 2011

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$35.00

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