Chromium Contamination in Silicon: Detection and Impact on Oxide Performances

Maria Luisa Polignano; Daniele Caputo; F. Cerutti; M. Cottini; L. Farini; J. Reffle

doi:10.4028/www.scientific.net/SSP.103-104.227

Paper Titles

Simultaneous Analysis of Light and Heavy Organic Contamination on Silicon Wafer
p.209

VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers
p.213

Cu Spin Cleaning Evaluation by SOR X-Ray Fluorescence Analysis
p.217

Application of HPLC for the Analysis of Organic Additives in Cleaning Chemicals and Cleaning Mixtures
p.221

Chromium Contamination in Silicon: Detection and Impact on Oxide Performances
p.227

Further Reduction of Trace Level Ion from Ultra Pure Water and Its Effect on Electrical Property of Device
p.233

Prevention of Copper Cross-Contamination on Cu Process and Non-Cu Process Mixed Fabrication
p.237

Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
p.241

Direct Mixing Cleaning Method of Aqua Regia on Wafer
p.245

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Chromium Contamination in Silicon: Detection and Impact on Oxide Performances

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Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

227-232

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.227

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Online since:

April 2005

Authors:

Maria Luisa Polignano, Daniele Caputo, F. Cerutti, M. Cottini, L. Farini, J. Reffle

Keywords:

Carrier Lifetime, Chromium, Contamination, DLTS, Oxide Reliability

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References

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