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Ultra Clean Processing of Silicon Surfaces

Solid State Phenomena Volumes 65 - 66

• Papers
• Abstracts

• p1 The Rinsing Problem: Effect of Solute-Surface Interactions on Wafer Purity   [ 305 K ]
  Authors: Lee M. Loewenstein, Paul W. Mertens
• p7 Hydrogenated Ultrapure Water Production System for Future Wet Cleaning Process   [ 226 K ]
  Authors: Hiroshi Morita, Jun ichi Ida, T. Mizuniwa, Tadahiro Ohmi
• p11 Behaviour of Metallic Contaminants during Mos Processing   [ 243 K ]
  Authors: Twan Bearda, Stefan De Gendt, Lee M. Loewenstein, M. Knotter, Paul W. Mertens, Marc M. Heyns
• p15 Hydrogen Peroxide Decomposition in Ammonia Solutions   [ 189 K ]
  Authors: D. Martin Knotter, Stefan De Gendt, M. Baeyens, Paul W. Mertens, Marc M. Heyns
• p19 New Aspects of the Diluted Dynamic Clean Process   [ 222 K ]
  Authors: F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, P. Boelen, C. Cowache, Ismail Kashkoush, R. Novak
• p23 Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning   [ 228 K ]
  Authors: M. Baeyens, W. Hub, B.O. Kolbesen, A.R. Martin, Paul W. Mertens
• p27 Particle Removal Efficiency and Silicon Roughness in HF-DIW/O₃/Megasonics Cleaning   [ 276 K ]
  Authors: Mauro Alessandri, Enrico Bellandi, Francesco Pipia, F. Cazzaniga, K. Wolke, M. Schenkl
• p31 Industrial Trends in Wet Processing Technology   [ 272 K ]
  Authors: L.F.Tz. Kwakman, M. Geomini, Didier Lévy, D. Malgouyres
• p35 Particle Addition Behaviour of Oxide Stripping by HF Solutions   [ 283 K ]
  Authors: Enrico Bellandi, Mauro Alessandri, Francesco Pipia, A. Tonti
• p39 The Electrochemical Kinetics of Silicon Surface Corrosion in HF Containing Dilute Solutions   [ 217 K ]
  Authors: V. Bertagna, F. Rouelle, R. Erre, M. Chemla