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Ultra Clean Processing of Silicon Surfaces VI

Solid State Phenomena Volume 92

• Papers
• Abstracts

• p1 Future Challenges for Cleaning in Advanced Microelectronics   [ 389 K ]
  Authors: Allen Bowling, Brian Kirkpatrick, Trace Hurd, Laura Losey, Phil Matz
• p7 Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers   [ 210 K ]
  Authors: Martine Claes, T. Witters, G. Loriaux, S. Van Elshocht, A. Delabie, Stefan De Gendt, Marc M. Heyns, Harald Okorn-Schmidt
• p11 Wet Etch Enhancement of HfO₂ Films by Implant Processing   [ 230 K ]
  Authors: Joel Barnett, Deborah Riley, Troy C. Messina, Pat Lysaght, Ron Carpio
• p15 Behaviour of High-k Dielectric Materials with Classical Cleaning Chemistries   [ 172 K ]
  Authors: Enrico Bellandi, Barbara Crivelli, Mauro Alessandri
• p19 Introduction of High-k Materials into Wet Processing, Analysis and Behavior   [ 216 K ]
  Authors: Bart Onsia, David Hellin, M. Claes, A. Maes, Stefan De Gendt, Marc M. Heyns
• p23 Metallic Impurity Contamination from Tungsten Gate Cleaning   [ 250 K ]
  Authors: Geun Min Choi, Tadahiro Ohmi
• p27 Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning   [ 335 K ]
  Authors: Rita Vos, Marcel Lux, Sophia Arnauts, Karine Kenis, M. Maes, Bart Onsia, J. Snow, Frank Holsteyns, Guy Vereecke, Paul W. Mertens, Marc M. Heyns, O. Doll, A. Fester, B.O. Kolbesen, T. Hackett, Mark Hoffman
• p33 Single Chemistry Cleaning with Complexing Agents (CAs): Determination of CA-Lifetimes by UV/VIS-Spectroscopy   [ 241 K ]
  Authors: O. Doll, B.O. Kolbesen
• p37 Complexing Agents Employed in Single Chemistry Cleaning: Stability Studies Using HPLC   [ 208 K ]
  Authors: S. Metzger, B.O. Kolbesen
• p41 Stability and Residue Studies of Complexing Agents in SC-1 Bath   [ 185 K ]
  Authors: Heini Saloniemi, Simo Eränen, Raimo A. Ketola, Juha Kokkonen, Sari Lehto, Kaija Luomanperä, Pertti Vastamäki, Heli Sirén, Olli Anttila