HOME CONTACT

Username: Password:

> @scientific.net

Ultra Clean Processing of Silicon Surfaces

Solid State Phenomena Volumes 65 - 66

• Papers
• Abstracts

• p67 Potassium Adhesion to Various CVD Oxide and the Surface Cleaning with Hot UPW   [ 131 K ]
  Authors: T. Jizaimaru, H. Kanetaka, S. Omae, Tadahiro Ohmi
• p71 Production Performance of Single Tank Cleaning Processes for 0,25 μm Technology   [ 282 K ]
  Authors: K. Penner, K. Schupke, R. Pesce, J. Oshinowo, K. Wolke
• p77 Ozonated DI-Water for Clean Chemical Oxide Growth   [ 188 K ]
  Authors: I. Cornelissen, Marc Meuris, K. Wolke, M. Wikol, Lee M. Loewenstein, G. Doumen, Marc M. Heyns
• p81 Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions   [ 146 K ]
  Authors: F. De Smedt, Chris Vinckier, I. Cornelissen, Stefan De Gendt, Marc Meuris, G. Gilis, Marc M. Heyns
• p85 Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation   [ 252 K ]
  Authors: J. Ruzyllo, Erika Röhr, M. Baeyens, Twan Bearda, Paul W. Mertens, Marc M. Heyns
• p89 Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric   [ 232 K ]
  Authors: F. Lanckmans, Mikhail R. Baklanov, C. Alaerts, Serge Vanhaelemeersch, Karen Maex
• p93 Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?   [ 232 K ]
  Authors: Stefan De Gendt, A. Huber, Bart Onsia, Sophia Arnauts, Karine Kenis, D. Martin Knotter, Paul W. Mertens, Marc M. Heyns
• p97 Characterization of the Post Dry Etch Cleaning of the Silicon Surface Prior to Silicon Epitaxial Growth   [ 217 K ]
  Authors: Y.B. Kim, Matty Caymax, H. Bender, Serge Vanhaelemeersch
• p101 Silicon Contamination Prevention in HF Mixtures   [ 215 K ]
  Authors: V. Bertagna, F. Rouelle, R. Erre, M. Chemla
• p105 Applications of Tetramethylammoninium Hydroxide (TMAH) as a Post Tungsten CMP Cleaning Mixture   [ 134 K ]
  Authors: M. Jolley
• p109 Fe and Cu Removal Efficiency in HF-DIW/O₃ Cleaning Sequence   [ 187 K ]
  Authors: Francesco Pipia, Enrico Bellandi, Barbara Crivelli, Mauro Alessandri
• p113 Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning   [ 264 K ]
  Authors: Simon Y.M. Chooi, Ping-Yu Ee, B.-M. Seah, Mei Sheng Zhou
• p117 Determination of Moisture / Water in Semiconductor Processing Liquids On-Line with the SemiChem Process Analyzer   [ 122 K ]
  Authors: J.H. Evans-Freeman, G. Frank, P.M. Robertson
• p119 Evaluation of Cleaning Recipes Based on Ozonated Water for Pre-Gate Oxide Cleaning   [ 204 K ]
  Authors: Joong S. Jeon, Bob Ogle, M. Baeyens, Paul W. Mertens
• p123 Characterization of Emitter Interface Oxide Growth in a Vertical LPCVD Polysilicon Deposition Reactor   [ 185 K ]
  Authors: M. Ramin, C. Hechtl, A. Haeusler