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Ultra Clean Processing of Silicon Surfaces V

Solid State Phenomena Volumes 76 - 77

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• p189 Fundamentals of Wafer Rinse Processes and the Interactions with Water Conservation and Recycling in Semiconductor Manufacturing Plants   [ 101 K ]
  Authors: F. Shadman, D. Seif, T. Peterson
• p191 A Novel Rinsing Tank Concept to Save DI Water Using an Internal Recirculation Flow: 'Circle Stream Rinser'   [ 233 K ]
  Authors: F. Tardif, F. de Bourmont, T. Vareine, V. Oravec, A. Di Martino
• p195 Rinsing and Drying Effects on Heterogeneous Substrates   [ 277 K ]
  Authors: Wim Fyen, Rita Vos, K. Devriendt, Marc Meuris, Paul W. Mertens, Marc M. Heyns
• p199 Low Consumption Front End of the Line Cleaning: LC-FEOL   [ 278 K ]
  Authors: Pascal Besson, C. Cowache, J.M. Fabbri, F. Tardif, Alessio Beverina
• p203 New Single Wafer Double Sided Spin Cleaning Method   [ 246 K ]
  Authors: Walter Starflinger, Reinhard Sellmer, Stefan Detterbeck, Alfred Lechner, Jörg Leberzammer, Hans-Jürgen Kruwinus
• p207 Determination of Photoresist Degradation Products in O₃/DI Processing   [ 232 K ]
  Authors: H. Vankerckhoven, F. De Smedt, B. Van Herp, Martine Claes, Stefan De Gendt, Marc M. Heyns, Chris Vinckier
• p211 The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning   [ 152 K ]
  Authors: F. De Smedt, Stefan De Gendt, Marc M. Heyns, Chris Vinckier
• p215 Control of Ozonated Water Cleaning Process for Photoresist Removal   [ 171 K ]
  Authors: Sang Woo Lim, C.E.D. Chidsey
• p219 New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory   [ 189 K ]
  Authors: Makoto Miyamoto, Izumi Oya, Seiji Noda, Masaki Kuzumoto
• p223 A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings   [ 249 K ]
  Authors: Martine Claes, Stefan De Gendt, C. Kenens, Thierry Conard, H. Bender, W. Storm, T. Bauer, Sebastien Lagrange, Paul W. Mertens, Marc M. Heyns
• p227 From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench   [ 198 K ]
  Authors: T. Riedel, K. Wolke, Stefan De Gendt, Bart Onsia
• p231 Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor   [ 274 K ]
  Authors: Sokrates T. Pantelides, Senri Ojima, Takahisa Nitta, Nobuhiro Miki, Tadahiro Ohmi
• p235 Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices   [ 422 K ]
  Authors: Akihiro Tomozawa, Akihiro Ohnishi, Hideo Kinoshita, Takashi Nakano
• p241 Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line   [ 198 K ]
  Authors: Yutaka Shimada, Hiroshi Itou, Y. Ishii, Tatsumi Shirasu, Akihiro Tomozawa
• p245 Particle Removal Mechanism of Hydrogenated Ultrapure Water with Megasonic Irradiation   [ 227 K ]
  Authors: Hiroshi Morita, Jun ichi Ida, Osamu Ota, Kazumi Tsukamoto, Tadahiro Ohmi