Growth of Few Layers Graphene on Silicon Carbide from Nickel Silicide Supersaturated with Carbon

Abstract:

Article Preview

Few Layers Graphene (FLG) films were grown on the carbon-terminated surface of 4H-SiC from nickel silicide supersaturated with carbon. The process was realised by annealing of thin Ni films deposited on silicon carbide followed by wet processing to remove the nickel silicide. To identify and characterize the fabricated FLG films, micro-Raman scattering spectroscopy, AFM and optical microscopy have been used. The films grown on samples with initially deposited nickel thinner than 20 nm show clear graphene footprints in micro-Raman scattering spectra, namely a single component, Lorentzian shape 2D band with FWHM remarkably lower than that of the 2D peak of graphite.

Info:

Periodical:

Materials Science Forum (Volumes 645-648)

Edited by:

Anton J. Bauer, Peter Friedrichs, Michael Krieger, Gerhard Pensl, Roland Rupp and Thomas Seyller

Pages:

589-592

DOI:

10.4028/www.scientific.net/MSF.645-648.589

Citation:

K. Vassilevski et al., "Growth of Few Layers Graphene on Silicon Carbide from Nickel Silicide Supersaturated with Carbon", Materials Science Forum, Vols. 645-648, pp. 589-592, 2010

Online since:

April 2010

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.