Ultra Clean Processing of Silicon Surfaces
Solid State Phenomena Volumes 76 - 77
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p1
Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects
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447 K
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Authors: B.O. Kolbesen, Hans Cerva, G. Zoth -
p7
The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution
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84 K
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Authors: Lee M. Loewenstein, Paul W. Mertens, Marc M. Heyns -
p9
Barium, Strontium and Bismuth Contamination in CMOS Processes
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370 K
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Authors: H. Boubekeur, T. Mikolajick, J. Höpfner, C. Dehm, W. Pamler, J. Steiner, G. Kilian, B.O. Kolbesen, Anton J. Bauer, Lothar Frey, H. Ryssel -
p15
An Exploration on the Bridge Formation Mechanism of Cylindrical Storage Poly-Silicon by Water Marks in High Performance 4Gigabit DRAM Capacitor
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234 K
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Authors: Kun Tack Lee, Woo Gwan Shim, Hyung Ho Ko, Ho Young Kim, Yong Pil Han, Sang Rok Hah, Joo Tae Moon -
p19
Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks
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223 K
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Authors: J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff -
p23
Wettability Modification of Polysilicon for Stiction Reduction in Silicon Based Micro-electromechanical Structures
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205 K
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Authors: Angeles Marcia Almanza-Workman, Srini Raghavan, Pierre Deymier, David J. Monk, Ray Roop -
p27
Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence
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212 K
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Authors: Didier Lévy, Sébastien Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti -
p31
New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals
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229 K
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Authors: D.L. Rath, R. Ravikumar, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, B.N. Rhoads -
p35
Metal Wet Cleaning with No Corrosion: A Novel Approach
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217 K
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Authors: Francesco Pipia, Geun Min Choi, Tadahiro Ohmi -
p39
Non-Contact Post Cu CMP Cleaning Using Megasonic Energy
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273 K
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Authors: Wim Fyen, Jeffrey M. Lauerhaas, Ingrid Vos, Marc Meuris, Paul W. Mertens, Marc M. Heyns
