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Ultra Clean Processing of Silicon Surfaces V

Solid State Phenomena Volumes 76 - 77

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• p63 Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices   [ 155 K ]
  Authors: F. De Smedt, Stefan De Gendt, Marc M. Heyns, Chris Vinckier
• p67 Surface Characterization after Different Wet Chemical Cleans   [ 225 K ]
  Authors: Martine Claes, Erika Röhr, Thierry Conard, F. De Smedt, Stefan De Gendt, W. Storm, T. Bauer, Paul W. Mertens, Marc M. Heyns
• p71 A Hydrogenated Water Application to Semiconductor Manufacturing   [ 188 K ]
  Authors: Ikunori Yokoi, Geun Min Choi, Yoshio Yamazaki, Tadahiro Ohmi
• p75 Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS   [ 250 K ]
  Authors: Jiang Bo Wang, M. Balazs, Piero Pianetta, K. Baur, S. Brennan
• p81 Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces   [ 219 K ]
  Authors: V. Bertagna, R. Erre, F. Rouelle, M. Chemla, Sébastien Petitdidier, Didier Lévy
• p85 Pre-Diffusion Cleaning Using Ozone and HF   [ 333 K ]
  Authors: Eric J. Bergman, Sebastien Lagrange, Martine Claes, Stefan De Gendt, Erika Röhr
• p89 Novel Back Side Processes for Copper and Pre-Lithography Cleans   [ 621 K ]
  Authors: Brian Aegerter, Sebastien Lagrange, Curt Dundas, Patrick Van Doorne
• p93 Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment   [ 230 K ]
  Authors: Sébastien Petitdidier, H. Bernard, Enrico Bellandi, F. Landa, H. Shirakawa, Didier Lévy
• p97 Reduced Water Consumption for Post Clean Treatment and Metal Ion Contamination on VLSI Structures   [ 191 K ]
  Authors: Robert Small, Zhe Fei Chen, Cherry Wang, Becky Hon
• p101 Post SiN Etching Cleaning During Copper and Low K Integration   [ 268 K ]
  Authors: Alessio Beverina, Didier Louis, C. Arvet, E. Lajoinie, Pascal Besson, C. Peyne, Douglas Holmes, D. Maloney, S. Lee, W.M. Lee
• p105 Wet Preparation of Defect-Free Hydrogen-Terminated Silicon Wafer Surface and Its Characterization in Atomic-Scale   [ 458 K ]
  Authors: Takayuki Takahagi, Shozo Shingubara, Hiroyuki Sakaue
• p111 Detection and Identification of Organic Contamination on Silicon Substrates   [ 253 K ]
  Authors: A. Roche, S. Marthon, J.F. Ple, Névine Rochat, Adrien Danel, M. Olivier, M. Juhel, F. Tardif
• p115 Preparation and Characterization of Time Dependent Haze on Silicon Surfaces   [ 292 K ]
  Authors: N. Münter, Bernd O. Kolbesen, W. Storm, Timo Müller
• p119 Single Chemistry Cleaning Solution for Advanced Wafer Cleaning   [ 195 K ]
  Authors: Rita Vos, O. Doll, A. Fester, Bernd O. Kolbesen, Marcel Lux, Karine Kenis, Bart Onsia, S. Degendt, E. Schellkes, Z. Hatcher, Paul W. Mertens, Marc M. Heyns
• p123 Behaviors of Metallic Contaminants in Si Wafer Processing   [ 177 K ]
  Authors: Joong S. Jeon, Stefan De Gendt, Srini Raghavan, Marcia Almanza-Workman, Cynthia Gonsalves, Bob Ogle