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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66

Solid State Phenomena Vols. 65-66

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66

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Paper Title Page

The Electrochemical Kinetics of Silicon Surface Corrosion in HF Containing Dilute Solutions

Authors: V. Bertagna, F. Rouelle, R. Erre, M. Chemla

39

Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency

Authors: H. Kanetaka, Toshihiko Kujime, H. Yazaki, T. Kezuka, Tadahiro Ohmi

43

Optimization of Deionized Water Consumption in Wafer Wet Processing

Authors: Ismail Kashkoush, R. Novak

49

Chemistry of the Silicon Oxide Surface: Adsorption from SC1 Solutions

Authors: L. Hall, J. Sees, Trace Hurd, B. Schmidt, L. Bellay, Lee M. Loewenstein, Paul W. Mertens

53

Production of High Concentrations of Bubble-Free Dissolved Ozone in Water

Authors: C. Gottschalk, U. Beuscher, S. Hardwick, Masakazu Kobayashi, J. Schweckendiek, M. Wikol

59

Si-Purifier: A Point of Use Purifier for Noble Metals in HF Baths

Authors: Alessio Beverina, F. Tardif

63

Potassium Adhesion to Various CVD Oxide and the Surface Cleaning with Hot UPW

Authors: T. Jizaimaru, H. Kanetaka, S. Omae, Tadahiro Ohmi

67

Production Performance of Single Tank Cleaning Processes for 0,25 μm Technology

Authors: K. Penner, K. Schupke, R. Pesce, J. Oshinowo, K. Wolke

71

Ozonated DI-Water for Clean Chemical Oxide Growth

Authors: I. Cornelissen, Marc Meuris, K. Wolke, M. Wikol, Lee M. Loewenstein, G. Doumen, Marc Heyns

77

Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions

Authors: F. De Smedt, Chris Vinckier, I. Cornelissen, Stefan De Gendt, Marc Meuris, G. Gilis, Marc Heyns

81

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