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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66

Solid State Phenomena Vols. 65-66

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66

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Table of Contents

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Paper Title Page

Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation

Authors: Jerzy Ruzyllo, Erika Röhr, M. Baeyens, Twan Bearda, Paul W. Mertens, Marc Heyns

85

Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric

Authors: F. Lanckmans, Mikhail R. Baklanov, C. Alaerts, Serge Vanhaelemeersch, Karen Maex

89

Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?

Authors: Stefan De Gendt, A. Huber, Bart Onsia, Sophia Arnauts, Karine Kenis, D. Martin Knotter, Paul W. Mertens, Marc Heyns

93

Characterization of the Post Dry Etch Cleaning of the Silicon Surface Prior to Silicon Epitaxial Growth

Authors: Y.B. Kim, Matty Caymax, H. Bender, Serge Vanhaelemeersch

97

Silicon Contamination Prevention in HF Mixtures

Authors: V. Bertagna, F. Rouelle, R. Erre, M. Chemla

101

Applications of Tetramethylammoninium Hydroxide (TMAH) as a Post Tungsten CMP Cleaning Mixture

Authors: M. Jolley

105

Fe and Cu Removal Efficiency in HF-DIW/O₃ Cleaning Sequence

Authors: Francesco Pipia, Enrico Bellandi, Barbara Crivelli, Mauro Alessandri

109

Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning

Authors: Simon Y.M. Chooi, Ping-Yu Ee, B.-M. Seah, Mei Sheng Zhou

113

Determination of Moisture / Water in Semiconductor Processing Liquids On-Line with the SemiChem Process Analyzer

Authors: J.H. Evans-Freeman, G. Frank, P.M. Robertson

117

Evaluation of Cleaning Recipes Based on Ozonated Water for Pre-Gate Oxide Cleaning

Authors: Joong S. Jeon, Bob Ogle, M. Baeyens, Paul W. Mertens

119

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