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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77

Solid State Phenomena Vols. 76-77

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77

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Paper Title Page

Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces

Authors: V. Bertagna, R. Erre, F. Rouelle, M. Chemla, Sébastien Petitdidier, Didier Lévy

81

Pre-Diffusion Cleaning Using Ozone and HF

Authors: Eric J. Bergman, Sebastien Lagrange, Martine Claes, Stefan De Gendt, Erika Röhr

85

Novel Back Side Processes for Copper and Pre-Lithography Cleans

Authors: Brian Aegerter, Sebastien Lagrange, Curt Dundas, Patrick Van Doorne

89

Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment

Authors: Sébastien Petitdidier, H. Bernard, Enrico Bellandi, F. Landa, H. Shirakawa, Didier Lévy

93

Reduced Water Consumption for Post Clean Treatment and Metal Ion Contamination on VLSI Structures

Authors: Robert Small, Zhe Fei Chen, Cherry Wang, Becky Hon

97

Post SiN Etching Cleaning During Copper and Low K Integration

Authors: Alessio Beverina, Didier Louis, C. Arvet, E. Lajoinie, Pascal Besson, C. Peyne, Douglas Holmes, D. Maloney, S. Lee, W.M. Lee

101

Wet Preparation of Defect-Free Hydrogen-Terminated Silicon Wafer Surface and Its Characterization in Atomic-Scale

Authors: Takayuki Takahagi, Shozo Shingubara, Hiroyuki Sakaue

105

Detection and Identification of Organic Contamination on Silicon Substrates

Authors: A. Roche, S. Marthon, J.F. Ple, Névine Rochat, Adrien Danel, M. Olivier, M. Juhel, F. Tardif

111

Preparation and Characterization of Time Dependent Haze on Silicon Surfaces

Authors: N. Münter, Bernd O. Kolbesen, W. Storm, Timo Müller

115

Single Chemistry Cleaning Solution for Advanced Wafer Cleaning

Authors: Rita Vos, O. Doll, A. Fester, Bernd O. Kolbesen, Marcel Lux, Karine Kenis, Bart Onsia, S. De Gendt, E. Schellkes, Z. Hatcher, Paul W. Mertens, Marc Heyns

119

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