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Solid State Phenomena
Vol. 88
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Vols. 85-86
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Vols. 80-81
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Vols. 78-79
Solid State Phenomena
Vols. 76-77
Solid State Phenomena
Vols. 73-75
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Solid State Phenomena
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Solid State Phenomena Vols. 76-77

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77

ToC:

Table of Contents

Paper Title Page

Effect of Chemical Oxides Formed During Pre-Gate Oxide Cleaning on the Properties of Sub 20Ǻ Thick Ultra-Thin Stack Gate Dielectrics
Authors: Joong S. Jeon, Bob Ogle
165
Controlling Silicon Surface Roughness During Photochemical Cleaning
Authors: Jeffery W. Butterbaugh, Brent Schwab, Thomas Sorsch, Martin L. Green
169
Influence of Cleaning on the Quality of the Bonding Interface in Direct Bonded Silicon Wafers
Authors: W.A. Nevin, D.L. Gay, G. O'Neill
173
Characterization and Production Metrology of Thin Transistor Gate Dielectric Films
Authors: William Chism, Alain C. Diebold, Jesse Canterbury, Curt Richter
177
Electronic Properties of Wet-Chemically Prepared Oxide Layers
Authors: Heike Angermann, W. Henrion, M. Rebien
181
A Probe of Chemical Oxide Growth Conditions
Authors: Larry W. Shive, Claire Frey, Carissima Vitus
185
Fundamentals of Wafer Rinse Processes and the Interactions with Water Conservation and Recycling in Semiconductor Manufacturing Plants
Authors: F. Shadman, D. Seif, T. Peterson
189
A Novel Rinsing Tank Concept to Save DI Water Using an Internal Recirculation Flow: 'Circle Stream Rinser'
Authors: F. Tardif, F. de Bourmont, T. Vareine, V. Oravec, A. Di Martino
191
Rinsing and Drying Effects on Heterogeneous Substrates
Authors: Wim Fyen, Rita Vos, K. Devriendt, Marc Meuris, Paul W. Mertens, Marc Heyns
195
Low Consumption Front End of the Line Cleaning: LC-FEOL
Authors: Pascal Besson, C. Cowache, J.M. Fabbri, F. Tardif, Alessio Beverina
199

Showing 41 to 50 of 76 Paper Titles

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