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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77

Solid State Phenomena Vols. 76-77

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77

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Table of Contents

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Paper Title Page

New Single Wafer Double Sided Spin Cleaning Method

Authors: Walter Starflinger, Reinhard Sellmer, Stefan Detterbeck, Alfred Lechner, Jörg Leberzammer, Hans-Jürgen Kruwinus

203

Determination of Photoresist Degradation Products in O₃/DI Processing

Authors: H. Vankerckhoven, F. De Smedt, B. Van Herp, Martine Claes, Stefan De Gendt, Marc Heyns, Chris Vinckier

207

The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning

Authors: F. De Smedt, Stefan De Gendt, Marc Heyns, Chris Vinckier

211

Control of Ozonated Water Cleaning Process for Photoresist Removal

Authors: Sang Woo Lim, C.E.D. Chidsey

215

New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory

Authors: Makoto Miyamoto, Izumi Oya, Seiji Noda, Masaki Kuzumoto

219

A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings

Authors: Martine Claes, Stefan De Gendt, C. Kenens, Thierry Conard, H. Bender, W. Storm, T. Bauer, Sebastien Lagrange, Paul W. Mertens, Marc Heyns

223

From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench

Authors: T. Riedel, K. Wolke, Stefan De Gendt, Bart Onsia

227

Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor

Authors: Sokrates T. Pantelides, Senri Ojima, Takahisa Nitta, Nobuhiro Miki, Tadahiro Ohmi

231

Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices

Authors: Akihiro Tomozawa, Akihiro Ohnishi, Hideo Kinoshita, Takashi Nakano

235

Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line

Authors: Yutaka Shimada, Hiroshi Itou, Y. Ishii, Tatsumi Shirasu, Akihiro Tomozawa

241

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