Silicon Carbide and Related Materials 2004

Volumes 483-485

doi: 10.4028/

Paper Title Page

Authors: Z. Zolnai, A. Ster, N.Q. Khánh, E. Kótai, M. Posselt, Gábor Battistig, T. Lohner, J. Gyulai

Abstract: 500 keV nitrogen implantations at different tilt angles (0o, 0.5o, 1.2o, 1.6o, 4o) with respect to the c-axis of 6H-SiC were carried out....

Authors: Frank Schmid, Thomas Frank, Gerhard Pensl

Abstract: Hall effect investigations taken on Si+-/N+-, C+-/N+- or Ne+-/N+-co-implanted 4H-SiC layers and deep level transient spectroscopy...

Authors: Servane Blanqué, J. Lyonnet, Jean Camassel, R. Pérez, P. Terziyska, Sylvie Contreras, Phillippe Godignon, Narcis Mestres, Jordi Pascual

Abstract: We report a full wafer scale investigation of the activation of nitrogen and phosphorus ions co-implanted at room temperature in a 4H-SiC...

Authors: Mariaconcetta Canino, Antonio Castaldini, Anna Cavallini, Francesco Moscatelli, Roberta Nipoti, Antonella Poggi

Abstract: n+/p diodes have been realized by 300°C phosphorus ion implantation and subsequent annealing at 1300°C. An electrical characterization of...

Authors: P. Zhao, E. Rusli, Jun Hai Xia, Chung Ming Tan, Y. Liu, Chin Che Tin, S.F. Yoon, Weiguang Zhu, J. Ahn

Abstract: In this work, we present results on the study of bonding and concentration of carbon in 4H-SiC MOS structure by x-ray photoelectron...

Authors: C. Radtke, Israel J.R. Baumvol, B.C. Ferrera, Fernanda Chiarello Stedile

Abstract: The mechanisms of oxygen incorporation during dry thermal oxidation of 6H-SiC wafers were investigated. Isotopic tracing of oxygen was...

Authors: Junji Senzaki, Kazutoshi Kojima, Tomohisa Kato, Atsushi Shimozato, Kenji Fukuda

Abstract: The effects of dislocations in n-type 4H-SiC(0001) epitaxial wafers on the reliability of thermal oxides have been investigated....

Authors: Antonella Poggi, Andrea Parisini, Sandro Solmi, Roberta Nipoti

Abstract: The wet oxidation of (0001), Si-face, 6H-SiC pre-amorphised by Ar+ implantation has been investigated in the temperature range between 750...

Authors: Ryouji Kosugi, Kenji Fukuda, Kazuo Arai

Abstract: A high temperature rapid thermal processing (HT-RTP) above 1400oC was investigated for use in the gate oxide formation of 4H-SiC by a...

Authors: Amador Pérez-Tomás, Dominique Tournier, Phillippe Godignon, Narcis Mestres, José Millan

Abstract: Thin (~10nm) Si layers have been deposited using Rapid Thermal CVD at temperatures ranging 950°C-1050°C. RTCVD deposited Si layers have been...


Showing 151 to 160 of 255 Paper Titles