Solid State Phenomena Vols. 156-158

Abstract: We report on a light-beam-induced current (LBIC)-analysis of metal silicide defects arising from co-precipitation of copper and nickel in Cz-silicon-bicrystals produced by wafer direct bonding. Large colonies of silicide precipitates in the one wafer emerging from undisturbed growth from few nucleation sites were observed in different orientations with respect to the surface which correspond to Si {110} planes. From this, the colonies formed during copper-nickel co-precipitation reveal the same attributes as those colonies typical for copper precipitation in the absence of nickel. Oxygen related defects associated with a higher defect distribution in the other wafer were characterized by means of high resolution Transmission Electron Microscopy (TEM) and their temperature dependent LBIC signal.

Abstract: Oxygen precipitation in silicon has been studied in-situ by high energy X-ray diffraction. A gain of diffracted intensity is expected if an ideal crystal is distorted by growing precipitates as the diffraction mode changes from a dynamical to a more kinematical one. Irreversible changes in the intensity of a 220 and a 400 Bragg peak are detected for Czochralski grown samples only, but not in a float zone grown reference crystal. Thus, these changes are attributed to oxygen precipitation, which is confirmed by a subsequent classical ex-situ characterization. Further, the changes of the intensities of the two measured Bragg peaks are compared to each other to get the level of change in the diffraction mode from a dynamical to a kinematical one. The detection limit of the specific setup is estimated via a simulation of the defect inventory to correspond to a precipitate diameter of 50nm with the density of 6.9•109 1/cm3. The diffraction experiments are done with polychromatic and divergent X-rays generated by a laboratory source, albeit with high energy. This results in a simple and accessible setup for the characterization of oxygen precipitates.

Abstract: Chromium-free preferential etching techniques in combination with light optical microscopy were compared with the non-destructive Laser Scattering Tomography (LST) for the evaluation of crystal defect densities in Czochralski substrates grown under different conditions. Dichromate containing etching solutions (original Secco etch and dilute Secco etch) were included into the study as reference. The chromium-free etching solutions with high etch rates comprised mixtures of nitric, hydrofluoric and acetic acid with water (JEITA 1, MEMC). Those with low etch rates consisted of mixtures of nitric and acetic or propanoic acid with hydrogen peroxide which form peracetic or perpropanoic acid (Organic Peracid Etches). OPE solutions provide improved discrimination of different types of defects and work also on highly doped substrates. As a general result, it turned out that the defect densities determined by the preferential etching solutions applied were significantly higher than those evaluated by LST. Relatively close to the LST defect densities are those determined by original Secco etch for larger etch pits.

Abstract: In this paper, the influence of the gettering treatment on the distribution of diffusion length of minority charge carriers in multicrystalline silicon has been investigated. For the calculation of the parameters of diffusion length distribution, a new method has been proposed based on the mathematical treatment of experimentally measured integrated spectra of surface photovoltage measured by capacitor method (capacitor photovoltage). Obtained results show not only the increase of the average diffusion length as a result of used gettering procedure, but also the decrease of inhomogeneity of its distribution.

Abstract: The electron momentum distribution and microstructure of centers incorporating a vacancy (vacancies) and a group-V-impurity atom (P, As, Sb, or Bi) in oxygen-lean n-Ge crystals have been investigated by means of the angular correlation of the annihilation radiation (ACAR). The vacancy-group-V-impurity atom complexes have been induced by irradiation with 60Co γ – rays at Tirr. ≈ 280K. A split between the intensities of the high-momentum emission of the annihilation radiation measured before and after n-p-conversion has been revealed for the complexes containing smaller ion cores (P, As) and the larger ones (Sb, Bi), respectively. After n-p-conversion the electron density decreases slightly (but markedly) around the positron localized at the vacancy complexes incorporating P, Sb, and Bi impurity atom. This decrease is accompanied by a lessening of intensity of the high-momentum emission of the annihilation radiation thus bringing in a direct evidence of a multi-vacancy structure of the vacancy-group-V-impurity atom complexes after n-p-conversion; the electron density was found to be affected by the localized deep acceptor states related to these centers. The relaxation inward open volume is a common feature which is pronounced for As-containing complexes. Subvalent band states are suggested to contribute the high-momentum annihilation most markedly. The electron momentum density around the positron is due to rather by the elemental specificity of the surrounding atoms than by changes of the electron-positron many-body interaction in the vacancy-group-V-impurity atom complexes.

Abstract: We report a dynamic and microscopic investigation of electrical stress induced defects in metal-oxide-semiconductor (MOS) devices with high-k gate dielectric by using electron-beam induced current (EBIC) technique. The correlation between time-dependent dielectric breakdown (TDDB) characteristics and EBIC imaging of breakdown sites are found. A systematic study was performed on pre-existing and electrical stress induced defects. Stress-induced defects are related to the formation of electron trapping defects. The origin of pre-existing defects is also discussed in terms of oxygen vacancy model with comparing different gate electrodes.

Abstract: Silicon and germanium films epitaxially grown on metal oxide buffer layers on Si(111) substrates are characterized by different X-ray techniques, transmission electron microscopy and Raman spectroscopy. Pr2O3 and Y2O3 or a combination of both is used as buffer material. X-ray pole figure measurements and grazing incident X-ray diffraction prove that epi-semiconductor layers can be grown single crystalline with exactly the same in-plane orientation as the Si(111) substrate. Epi-Ge layers show a small fraction (less than 0.5 vol. %) of so-called type B rotation twin regions located near the oxide-Ge interface. The main structural defects for both epi materials are micro twin lamellas lying in {111} planes 70° inclined to the wafer surface that may reach through the whole layer from the oxide interface to the surface. Furthermore, TEM confirms the existence of stacking faults and threading dislocations. X-ray grazing incident diffraction and Raman measurements show that epi-Ge layers on Pr2O3 buffer are nearly fully relaxed, while epi-Si layers on Y2O3/Pr2O3 double buffer are compressive strained depending on their own thickness and the thickness of the underlying Y2O3 layer. It is demonstrated that the epi-layer quality can be improved by post-deposition annealing procedures.

Abstract: Characterization of defect structure in silicon ribbon grown on carbon foil has been carried out. The structure of grown Si layers and a dislocation density in these layers have been studied using selective chemical etching and the Electron Backscattering Diffraction. It is observed that the layers consist of rather large grains, the majority of which is elongated along the growth direction with a similar surface orientation and with a misorientation angle between neighboring grains of 60º. This means that such grains are separated by the (111) twin boundaries. The dislocation density in different grains is found to vary from 102 to 107cm-2. The energy dispersive X-Ray microanalysis has shown that some twin boundaries are enriched with carbon.

Abstract: A new bulge test device has been built, with the aim to perform mechanical tests on membranes with a thickness in the 100 nm to 10 µm range, between room temperature and 900°C. The first tests on Si3N4 and gold films give results consistent with literature data.

Abstract: Germanium is an attractive model system for studying the crystallization mechanism and optimization of the growth processes in photovoltaics. In comparison to Si it has a lower melting point and that is why its usage is cost effective. The main aim of our work was to verify the similarities in the growth related defect formation between Ge and Si. We apply standard Si characterization methods to poly and VGF-grown n-type Ge. Room temperature and 80 K EBIC measurements were done to reveal the defect structure. Photoluminescence spectra were used to characterize the optical properties as for instance the Ge band-to-band or defect originated transitions. Additionally, photoluminescence and cathodoluminescence maps were preformed to reveal the defect distribution/activity, too, by using the direct Ge band-to-band transition.