Materials Science Forum Vols. 615-617

Abstract: The pulsed MOS-C (Metal Oxide Semiconductor-Capacitor) technique was used to measure generation lifetimes in 4H-SiC epitaxial wafers. The ratio of generation to recombination lifetime has been investigated to understand the dominant defect for generation lifetime. The EH6/7 defect level is considered to limit generation lifetime and field enhanced emission is proposed to explain extremely large variation of generation lifetime in a small area. Generation lifetime is limited by dislocations when they are above a threshold density of about 106cm-2. Generation lifetimes measured on 4 and 8 degree off-cut angle epi-substrates are very comparable.

Abstract: Effective recombination lifetimes of 4H-SiC PiN epitaxy wafers are measured by -PCD (microwave photoconductive decay) system at wafer level. Lifetimes measured in presence and absence of the p+ layer show lower lifetime values with p+ layer present. This is attributed to high recombination rate at p+/n- interface. Lifetimes at various buffer thicknesses show lower values at the buffer layer of about 50 m due to high interface recombination rate resulting from rougher surface of the buffer layer. Lifetimes of PiN wafers from interrupted and continuous p+/n- growth are very comparable.

Abstract: In this work we report the measurement of minority carrier lifetimes using the time resolved photoluminescence technique. It was found that 4H-SiC homo-epilayers grown using chlorine-based precursors have longer carrier lifetimes if used in conjunction with a tantalum carbide coated (TaC-coated) graphite susceptor rather than a SiC-coated graphite susceptor. Longer carrier lifetimes were obtained by optimal combinations of precursor gases and susceptor type. The controllable variation in lifetime from 250 ns to 9.9 s was demonstrated.

Abstract: We report on measurements of the minority carrier lifetime for different epitaxial 4H-SiC layers by using the microwave photoconductivity decay (µ-PCD) method. This is a non-contacting, non-destructive method very useful for the monitoring of recombination processes in semiconductor material. Distinct samples have been analyzed, giving different lifetime values. Transmittance and absorption spectra have also been carried out. The n-type layers, giving rise to a specific absorption peak near 470 nm, are not sensitive to optical excitation for the used wavelengths, as opposite to p-type layers whose lifetime values depend on thickness and doping.

Abstract: We have identified a magnetic resonance spectrum associated with minority carrier lifetime killing defects in device quality 4H SiC.

Abstract: We applied a picosecond dynamic grating technique for studies of nonequilibrium carrier dynamics in a 0.8 mm thick bulk 3C-SiC crystal grown by the continuous feed physical vapor transport (CF-PVT) on 6H-SiC (0001) substrate. Investigation of carrier dynamics at surface or bulk excitation conditions was performed for excess carrier density in range from ~ 1017 cm-3 to ~ 1020 cm3 using for excitation weakly or strongly absorbed illumination. In DPBs free domains, the bipolar diffusion coefficient and carrier lifetime value at 300K were found gradually increasing with carrier density. The bipolar mobility vs. temperature dependence, μ. ~ T -k, provided a value k = 1.2 - 2 in range T < 100 K, thus indicating a negligible scattering by point and extended defects. These data indicated strong contribution of the carrier-density dependent but not defect-density governed scattering mechanisms, thus indicating high quality of the CF-PVT grown bulk cubic SiC. These studies were found in good correlation with the structural and photoluminescence characterization of the given crystal.

Abstract: In materials with a small degree of ionicity ranging 10-15%, such as in SiC, carrier scattering on polar optical potential is possible. Unlike scattering on deformation potential, the drift mobility in this case increases continuously. As this phenomenon may be realized in SiC hot hole transport, I-F characteristics in 6H-SiC with Na-Nd ~ 5x1017 cm-3 have been studied at electrical field 1-150 kV/cm for temperature from 300 to 600K. Furthermore, we studied the breakdown of Al impurity.

Abstract: Hole initiated multiplication characteristics of 4H-SiC Separate Absorption and Multiplication Avalanche Photodiodes (SAM-APDs) with a n- multiplication layer of 2.7 µm were obtained using 325nm excitation at temperatures ranging from 300 to 450K. The breakdown voltages increased by 200mV/K over the investigated temperature range, which indicates a positive temperature coefficient. Local ionization coefficients, including the extracted temperature dependencies, were derived in the form of the Chynoweth expression and were used to predict the hole multiplication characteristics at different temperatures. Good agreement was obtained between the measured and the modeled multiplication using these ionization coefficients. The impact ionization coefficients decreased with increasing temperature, corresponding to an increase in breakdown voltage. This result agrees well with the multiplication characteristics and can be attributed to phonon scattering enhanced carrier cooling which has suppressed the ionization process at high temperatures. Hence, a much higher electric field is required to achieve the same ionization rates.

Abstract: Second-order nonlinear-optical coefficients of 4H and 6H-SiC have been measured with the wedge technique. Using high-quality (11-20) samples as well as performing rigorous measurements and analyses, the three independent components, d31 (= d32), d15 (= d24), and d33, have been accurately determined. We have found that the nonlinear-optical coefficients are nearly the same between the measured 4H and 6H-SiC samples within the experimental accuracy; d31 = 5.4 pm/V, d15 = 6.2 pm/V, and d33 = 9.7pm/V.

Abstract: We applied a picosecond dynamic grating technique for investigation of thermal diffusivity, sound velocity, thermo-optic and photoelastic coefficients in heavily doped 4H-SiC substrates. Spatial modulation of thermal properties was achieved by intraband carrier absorption at excitation by an IR picosecond laser pulse (1064 nm) and subsequent carrier thermalisation. Decay of dynamic grating at its various periods and sample temperatures was monitored at 532 nm wavelength. The thermal diffusivity DT = 0.94 cm2/s, thermo-optic coefficient dn/dT = 3.610–5 K-1 and effective photoelastic constant = – 0.10 were determined at 300 K. DT value increased at lower temperatures and saturated below 100 K. Temperature dependences of thermo-optic coefficient and thermal expansion were found in good correlation with heat capacity peculiarities.